Ultrasonic Spray Technology for Solar Cell Coating
Ultrasonic spray technology is used in both photovoltaic crystalline silicon (c-Si) and thin film applications. Ultrasonic spray technology when compared to chemical vapor technology (CVD), sputtering, spin coating, roll coating and fog coating techniques can be a more cost effective means of depositing thin film coatings onto solar cells. Due to the high uniformity of atomized droplets and their low velocity during the coating process, highly uniform, micron thick layers can be formed on c-Si and thin solar film cells. Added benefits of minimal waste or overspray can also lead to significant material savings.
Ultrasonic spray technology is used with the following chemistries:
Dopants, Absorbers, Buffers, Organics, Etc.
Boric acid dopants
Cadmium chloride (CdTe) absorbers
Cadmium sulfide (CdS) – buffer layer used in CIGS, CdTe cells
Copper indium gallium selenide (CIGS or CIS) absorbers
Copper zinc tin sulfide (CZTS) absorbers
Dye sensitized organic solar cells (DSC, DSSC or DYSC)
Phosphoric acid based dopants in emitter formation
Ultrasonic Spray of has successfully been used to spray a variety of Quantum Dots. Both ZnO films and CdS Quantum Dots have been prepared using ultrasonic spray pyrolysis deposition techniques at a fraction of the cost of CVD and sputtering methods.
Transparent Conductive Oxides (TCO)
Anti-Reflection (AR) Coatings
Microspray International can provide from R&D scale solutions to production equipment for solar cell coating.