Precursor for use in preparing layers on substrates
Assignee:
Inventors:
Brian A. Vaartstra
Patent:
Microdroplet generating Ultrasonic Nozzle
A vaporizing apparatus and method for providing a vaporized liquid precursor to a process chamber in a vapor deposition process includes a microdroplet forming ultrasonic nozzle for generating microdroplets from a liquid precursor and a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming ultrasonic nozzle to the process chamber. The vaporization zone receives the microdroplets and a heated carrier gas. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets. The vaporized liquid precursor is then directed to the process chamber from the heated vaporization zone.
The microdroplet generating ultrasonic nozzle generates high surface area microdroplets, for example, droplets of approximately 20 micrometers in diameter.
